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ICLR 2024

Dropout Enhanced Bilevel Training

Conference Paper Accept (spotlight) Artificial Intelligence ยท Machine Learning

Abstract

Bilevel optimization problems appear in many widely used machine learning tasks. Bilevel optimization models are sensitive to small changes, and bilevel training tasks typically involve limited datasets. Therefore, overfitting is a common challenge in bilevel training tasks. This paper considers the use of dropout to address this problem. We propose a bilevel optimization model that depends on the distribution of dropout masks. We investigate how the dropout rate affects the hypergradient of this model. We propose a dropout bilevel method to solve the dropout bilevel optimization model. Subsequently, we analyze the resulting dropout bilevel method from an optimization perspective. Analyzing the optimization properties of methods with dropout is essential because it provides convergence guarantees for methods using dropout. However, there has been limited investigation in this research direction. We provide the complexity of the resulting dropout bilevel method in terms of reaching an $\epsilon$ stationary point of the proposed stochastic bilevel model. Empirically, we demonstrate that overfitting occurs in data cleaning problems, and the method proposed in this work mitigates this issue.

Authors

Keywords

  • Bilevel Optimization
  • Overfitting

Context

Venue
International Conference on Learning Representations
Archive span
2013-2025
Indexed papers
10294
Paper id
475881101481094369
v2026.09.13