EAAI Journal 2026 Journal Article
Defect detection of monocrystalline silicon wafers for photovoltaic applications using an improved you only look once version 8 small algorithm
- Wenbo Bi
- Xinyu Wang
- Na Liu
- Xu Xing
- Lu Li
- Hao Liu
Defects on the surface of photovoltaic monocrystalline silicon wafers, such as cracks, corners, and water stains, lead to significant performance degradation and economic losses during manufacturing. To address this, this paper proposes an improved You Only Look Once version 8 small (YOLOv8s) model. The proposed architecture integrates four strategic innovations. First, an Efficient Multi-Scale Convolution (EMSC) module is combined with the Cross-Stage Partial Bottleneck module with two convolutions (C2f) to enhance multi-scale feature extraction capabilities. Second, Spatial Pyramid Pooling-Fast (SPPF) is fused with the Large Separable Kernel Attention (LSKA) module to overcome limitations in processing local details. Third, the Dysample dynamic upsampling operator is introduced to maintain a compact model size while effectively improving detection speed. Finally, the Normalized Wasserstein Distance (NWD) is utilized as the loss function to address the sensitivity of the Intersection over Union (IoU) metric to positional deviations, enhancing precision for small targets. Experimental results demonstrate that the Efficient Lightweight Detection Network (ELDN) achieves superior performance on the validation set with a mean Average Precision (mAP) of 92. 8%. Notably, it exhibits robust generalization on an independent external test set, attaining a mAP of 92. 6%. Validation confirms that YOLOv8s-ELDN consistently outperforms mainstream models. Future research will focus on further optimizing efficiency for deployment on resource-constrained edge devices and addressing defect detection in complex manufacturing environments.